Materials Chemistry and Physics, (Submitted) 2000
164
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Studies on deposition of antimony triselenide thin films by chemical method (SILAR)
B. R. Sankapal and C. D. Lokhande
Indian Journal of Pure Applied Physics, 38 (2000) 606-610
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165
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Structural, Optical and Electrical Properties of (CdS)x (Bi2S3) 1-x thin films deposited by Successive Ionic Layer Adsorption and Reaction (SILAR) method.
R. R. Ahire, B. R. Sankapal and C. D. Lokhande
Materials Research Bulletin, ( Submitted) (2000)
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166
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Preparation and characterization of lanthanum sulfide thin films deposited by spray pyrolysis techniques
G. D. Bagade , V. S. Yermune and C. D. Lokhande
Indian Journal Engineering Materials Science, 7 (2000) 390 –94
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167
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Photoelectrochemical cell based on chemically deposited nanocrystalline Sb2S3 thin films
R. S. Mane, B. R. Sankapal and C. D. Lokhande
Materials Chemistry and Physics, (Submitted) 2000
|
168
|
Preparation and characterization of Nickel Sulfide thin films deposited by Successive Ionic Layer Adsorption and Reaction (SILAR) method.
S. D. Sartale and C. D. Lokhande
Materials Chemistry and Physics, 72 (2001) 101-104
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169
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Studies on chemically deposited Sb2Se3 thin films
B. R. Sankapal and C. D. Lokhande,
Mater. Chem. Phys., (Submitted) 2000
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170
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Photoelectrochemical behavior of SILAR deposited Bi2Se3 thin films
B. R. Sankapal and C. D. Lokhande
Solar Energy Materials and Solar Cells, (submitted) 2000.
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171
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PEC studies on multilayer Bi2Se3-Sb2Se3 thin films grown by SILAR technique,
B. R. Sankapal and C. D. Lokhande
Solar Energy Materials and Solar Cells, 69 (2001) 43 – 52
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172
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Photoelectrochemical investigation of chemically deposited Bi2Se3-Sb2Se3 composite thin films
B. R. Sankapal and C. D. Lokhande,
Indian Journal of Pure Applied Physics, 38 (2000) 664
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173
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Studies on thin films deposited by SILAR Method from non-aqueous medium
B. R. Sankapal, R. S. Mane, and C. D. Lokhande,
Proc. IWPSD-99, New Delhi, 1428-1430
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174
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CuxS thin film formation using successive ionic layer adsorption and reaction (SILAR) method
S. D. Sartale and C. D. Lokhande
Materials Chemistry and Physics, 65 (2000) 63-67
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175
|
Preparation and characterization of As2S3 thin films deposited using successive layer adsorption and reaction (SILAR) method,
S. D. Sartale and C. D. Lokhande
Materials Research Bulletin, 35 (2000) 1345-1353
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176
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Preparation and characterization of HgS films
S. S. Kale and C. D. Lokhande
Materials Chemistry and Physics, 62 (2000) 103-108
|
177
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Photoelectrochemical (PEC) cell based on chemically deposited nanocrystalline, Bi2Se3-Sb2-Se3 composite thin films
B. R. Sankapal and C. D. Lokhande
Indian Journal of Pure Applied Physics, 38 (2000) 664-669.
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178
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Electrosynthesis of CdTe films from ethylene glycol bath
S. J. Lade, M. D. Uplane and C. D. Lokhande
Materials Chemistry and Physics, 63 (2000) 99-103.
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179
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Deposition of cobalt sulfide thin films by successive ionic layer adsorption and reaction (SILAR) method, and their characterization
S. D. Sartale and C. D. Lokhande
Indian Journal of Pure Applied Physics, 38 (2000) 48-52.
|
180
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Room temperature chemical bath deposition of Sb2Se3 thin films from alkaline medium
B. R. Sankapal and C. D. Lokhande
Indian Journal of Physics A, 75 (2001) 143
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181
|
Effect of annealing on electrosynthesized CuFe2O4 thin films
S. D. Sartale, H.M. Pathan and C. D. Lokhande
Proc. 43rd DAE-SSP symposium, 27-31 Dec., 43 (2000) 314-315
|
182
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Spray pyrolysed lanthanum sulphide thin films
G. D. Bagde, S, D. Sartale, B. R. Sankapal and C. D. Lokhande
Proc. 43rd DAE-SSP symposium, 27-31 Dec., 43 (2000) 540-541.
|
183
|
Room temperature preparation of NiFe2O4 thin films by electrochemical route
S. D. Sartale and C. D. Lokhande
Indian Journal of Engineering Materials Science, 7 (2000) 404 –410 |
|
2001
|
184
| Electrochemically deposition and oxidation of CuFe2 alloy thin films: a new method to deposit CuFe2O4 thin films
S. D. Sartale and C. D. Lokhande
Materials Chemistry and Physics, 70 (2001) 274-284
|
185
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